Strategic partners EPLAN, Phoenix Contact and Rittal are holding a series of half-day workshops and seminars to demonstrate how EPLAN, Phoenix Contacts's CLIP PROJECT and Rittal's Ri4Power design software, can work in synergy to facilitate the design, build and enclosure of control cabinets. Live demonstrations will take advantage of the particulars of each software package as well as highlighting the time and cost advantages of using the collective platform approach. Proficient designers will also benefit from the workshops by further honing their skills and learning additional beneficial features for further design proficiency.
EPLAN Software and Service specialises in computer aided engineering (CAE) software for the design of electrical control and automation systems, providing fast and error-free designs of electrical schematics with automatic cross-references and wiring. Phoenix Contact is a global developer and manufacturer of electronic interface and industrial automation technology. Phoenix Contact Clip Project software combines rail design and marking software into one easy-to-use package, allowing designs to move from concept to reality. Working in harmony through effortless data exchange, EPLAN and Clip Project gives greater accuracy, as terminal strips created in EPLAN can be automatically added to the Clip Project Software.
To complete the software union, Rittal will demonstrate its new enclosure platform approach to system building, which offers simplicity and flexibility by utilising common internal parts and accessories. Ri4Power Power Engineering Software supports designers in specifying and designing Motor Control Centres and power distribution assemblies, allowing drawings and parts lists to be achieved within minutes.
Workshops are to be held in Birmingham (13 May 2009), Aberdeen (4 June 2009), Southampton (17 June 2009) and Warrington (2 July 2009). Sessions begin at 12:30 with a complimentary lunch, followed by workshops until approximately 16:00. Registration is requested by emailing details of attendees and preferred venue to .